S01800 - SEMI S18 - 矽烷族氣體處理之安全衛生及環保基準 StdTpc-Facilities - Electrical SEMI E84-0999 (technical revision)

$193.00

Post

Description

SEMI E84-0999 (technical revision)

This Guide is applicable to any type of equipment for processing semiconductor units

1996년 12월에 최초 간행되었으며 2010년 5월에 출판되었다

and density of defects counted by this Test Method may be related to the crystal growth process

This method may provide guidelines for the application of other techniques with similar detection limits and response time to APIMS which are not commercially available at this time

S01800 - SEMI S18 - 矽烷族氣體處理之安全衛生及環保基準 StdTpc-Facilities - Electrical SEMI E84-0999 (technical revision)NOTICE: This translation is a REFERENCE COPY ONLY. If differences should exist between the English version and a translation in any other language, the English version is the official and authoritative version. FPDPV 1 Referenced SEMI Standards SEMI F1 Specification for Leak Integrity of High Purity Gas Piping Systems and ComponentsSEMI F5 Guide for Gaseous Effluent HandlingSEMI F6 Guide for Secondary Containment of Hazardous Gas Piping SystemsSEMI S1

Shipping Notes