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E15300 - SEMI E153 - Specification for AMHS SEM (AMHS SEM) Revision:SEMI E153-1109 - Superseded the user estimates all biases

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the user estimates all biases and variances associated with the equipment being compared under the specified operating conditions and with respect to the process characteristic(s) of interest

of fiducial notches on silicon wafers fall within specified limits

6  This Guide also provides a measurement procedure for local bow

Knowledge of near-edge geometrical properties can help the producer and consumer determine if the dimensional characteristics of a specimen wafer satisfy given geometrical requirements

This Practice can be applied to make relative cost comparisons between two or more measurement gauges operating under conditions specified by the user

E15300 - SEMI E153 - Specification for AMHS SEM (AMHS SEM) Revision:SEMI E153-1109 - Superseded the user estimates all biasesThis Standard establishes a Specific Equipment Model (SEM) for automated material handling system (AMHS) (AMHS SEM). The model consists of equipment characteristics and behaviors that are to be implemented in addition to the SEMI E30 fundamental requirements and selected additional capabilities. The intent of this Standard is to facilitate the integration of AMHS SEM equipment into an automated (e. g., semiconductor fabrication) factory. This Document

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